[01] Ogunmola Enoch D., Engineering Division, Prototype Engineering Development Institute, Ilesa, Osun State, Nigeria. [02] Famojuro A. T., Department of Chemistry, Obafemi Awolowo University, Ile-Ife, Nigeria. [03] Olofinjana B., Department of Physics, Obafemi Awolowo University, Ile-Ife, Nigeria. [04] Akinwunmi O., Department of Physics, Obafemi Awolowo University, Ile-Ife, Nigeria. [05] Ojo I. A. O., Department of Chemistry, Obafemi Awolowo University, Ile-Ife, Nigeria. [06] Ajayi E. O. B., Department of Physics, Obafemi Awolowo University, Ile-Ife, Nigeria.

Titanium nitride thin films were prepared by MOCVD technique from Ethylenediamine based metal organic precursor as a source material and were investigated in terms of volatility and stability by employing TG/DTA in transpiration mode, which led to thermal degradation in the temperature range of 105.9°C and 540.3°C. The effect of deposition temperature on TiN thin film deposited on soda-lime glass substrates were characterized using Ultraviolet-Visible Spectroscopy, Four-point probe technique, Scanning Electron Microscopy (SEM), optical microscope and Energy Dispersive X-ray Spectroscopy (EDS). Experimental results show that TiN thin film exhibited an amorphous behavior with honeycomb-like nature of surface roughness which depends on deposition temperature. The nitrogen atomic (%) proportion in TiN thin film increased from 46 to 51, the estimated thickness range from 152.08 to 167.29 and direct optical band gap varies from 3.62 eV to 3.68 eV as deposition temperature increases. The electrical resistivity ranging from 1.58 Ωcm to 1.81Ωcm also depends on deposition temperature. The findings showed that the synthesized precursor is a promising material for deposition of quality TiN thin films. It also demonstrates that the properties of the films depend on the deposition temperature.

TiN, Thin Film, MOCVD, Synthesis, Optical Property

[01] Ajayi O. B. (1970), Electrical and Optical Properties of Pyrolytically Deposited Indium Oxide. M.Sc., Thesis University of Illinois Urbana, USA. Electrical and Optical Properties of Pyrolytically Deposited Indium Oxide [Report]. - USA: M.Sc., Thesis University of Illinois Urbana, 1970. [02] Ajayi O. B. [et al.] Preparation and Characterization of MOCVD Thin Films of Cadmium Sulphide [Journal] // Thin Solid Films. - 1994. - Vol. 248. - pp. 57-63. [03] Ajayi O. B. Electrical and Optical Properties of Pyrolytically Deposited Indium Oxide [Book]. - [s.l.]: University of Illinios Urbana, 1970. [04] Arockiasamya S. [et al.] Deposition of Ni/TiN Composite Coatings by a Plasma Assisted MOCVD Using an Organometallic Precursor [Journal] // Micro and Nanosystems. - 2012. - Vol. 4. - pp. 199-207. [05] Bolutife Olofinjana [et al.] Effect of Deposition Temperature on Some Properties of MOCVD Molybdenum Sulphide Thin Films [Journal]. - [s.l.]: Journal of Materials Science and Engineering, 2014. - 4: Vol. B4. - pp. 78-85. [06] Chopra K L, Kainthla R C and Panadya D K Physics of Thin Films [Book]. - New York: Academic Press, 1982. - pp. 169-235. [07] Choy K. L. Chemical vapour deposition of coatings [Journal]. - [s.l.]: Progress in Materials Science, 2003. - Vol. 48. - pp. 57-170. [08] Del Caño T. [et al.] Characterization of evaporated trivalent and tetravalent phthalocyanines thin films: Different degree of organization. [Journal] // Appl. Surf. Sci.. - 2005. - Vol. 246. - pp. 327–333. [09] DeVore J. R. Refractive Index of Rutile and Sphalerite [Journal] // J. Opt. Soc. Am.. - 1951. - Vol. 41. - pp. 416-419. [10] Gabbott P. Ed. Principles and Applications of Thermal Analysis [Journal]. - [s.l.]: Blackwell, 2008. [11] Haines P. J. (Ed.) Principles of Thermal Analysis and Calorimetry [Journal]. - Cambridge¸ Uk: The Royal Society of Chemistry, 2002. [12] Heavens O. S. Thin Film Physics [Book]. - London: Methuen & Co and Science Paperback, 1970. - First Edition: Vol. 1: p. 533. [13] Hellgeth J. W., Chalmers J. M. and Griffiths P. R. (Eds) ‘Thermal Analysis–IR Methods’, in Handbook of Vibrational Spectroscopy [Journal] // Wiley. - Chichester: [s.n.], 2002. - Vol. 2. - pp. 1699-1714. [14] Hem'andez-Rodr'iguez, M'arquez-Herrera A and Zapata-Navarro Optical and structural characterization of TiOxNy films deposited by reactive magnetron sputtering [Journal] // REVISTA MEXICANADE'ISICA. - 2009. - 1: Vol. 55. - pp. 102-104. [15] Hohne G. W. H., Hemm inger W. F. and J. Flammer shem H. Differentia Scanning Calorimetry [Journal]. - New York: Springer Verlag Heideberg, 2003. [16] Hong S [et al.] [Journal]. - [s.l.]: J. Non-Crystal Solid, 1997. - Vol. 221. - p. 245. [17] Johausson S. A. E. and Cambell J. L. PIXE. A Novel Technique for Elemental Analysis [Book]. - [s.l.] : John Wiley and Sons, 1988. [18] Kahl T. [et al.] Aniline [Journal] // Ullmann's Encyclopaedia of Industrial Chemistry, Wiley-VCH., Weinheim. - 2005. - p. 1544. [19] Kalfagiannnis N and Logothetidis S. Colour dependency on optical and electronic properties of TiN thin films [Journal] // Rev. Adv. Mater. Sci.. - 2007. - Vol. 15. - pp. 167-172. [20] Khan Z. R., Zulfequar M. and Khan M. S. Optical and Structural Properties of Thermally Evaporated Cadmium Sulphide Thin Films on Silicon (100) Wafers [Journal] // Materials Science and Engineering: B. - 2010. - 1-3: Vol. 174. - pp. 145-149. [21] Kiran M. S. R. N, Krishna M. Ghanashyam and Padmanabhan K.A. [Journal] // Appl. Surf. Sci.. - 2008. - Vol. 255. - pp. 1934–1941. [22] Lau W. S. Infrared Characterization for Microelectronics [Journal] // Word Scientific. - 1999. [23] Leaver K. D. and Chapman B. N. Thin Films [Book]. - London: Wykeham Publication Ltd, 1971. [24] Leeward Yi, Wenjie Zhang and Jin Wu Study of metal organic chemical vapour deposition TiN thin films in real structures [Journal] // Thin solid films. - 2005. - Vol. 515. - pp. 2803-2806. [25] Liu Y. C. [et al.] Ultraviolet detectors based on epitaxial ZnO films grown by MOCVD [Journal] // Appl. Phys. Lett.. - 1999. - Vol. 46. - pp. 2215-2223. [26] Lu J. P. [et al.] Thermal Stability of Al/barrier/TiSix multilayer structures [Journal] // Thin Solid Films. - 1998. - Vol. 320. - pp. 20-25. [27] Martin O. Banakh [et al.] [Journal]. - [s.l.]: Appl. Surf. Sci., 2001. - Vol. 185. - pp. 123-133. [28] Milton Ohring The Materials Science of thin films [Book] / ed. Stevens Institute of Technology Department of Materials Science and Engineering Hoboken. - New Jersey: Academic Press, 1992. - pp. 22-23. [29] Pankove J. I. Optical Processes in Semiconductor. [Book]. - New York: Dover Publlication Inc., 1971. - pp. Chapter 3, 34. [30] Pankove J. I. Optical Processes in Semiconductors [Book]. - New Jersey: Dover Publications Inc., 1971. - p. 37. [31] Randall Kirshcman ed., High-Temperatures Electronics [Journal]. - NY: IEEE Press, 1999. - Vol. 7803. - pp. 3477-3479. [32] Robert W. B, Peter M. H and Murray T. H. Thin Film Technology [Book]. - New York: John Wiley and Sons Inc., 1968. - pp. 2-3, 395, 413-416. [33] Schrode D. K. Semiconductor Material and Device characterization [Journal]. - Arizona: Willey-Interscience Publication, 1998. - pp. 21-25. [34] Schroder Dieter D. Semiconductor Materials and Device Charaterization [Book]. - New York: Wiley and Sons, 1998. - 2nd Edition: pp. 1-54; 278. [35] Schroder K. Dieter Semiconductor Material and Device Characterization [Journal]. - New York: John Wiley and Sons, 1998. - 2nd Edition,. - pp. 1-54, 278. [36] Seong Jae Kim [et al.] Thermal Decomposition of Tetrakis(ethylmethylamido) Titanium for Chemical Vapor Deposition of Titanium Nitride [Journal] // Bull. Korean Chem. Soc.. - 2006. - 2: Vol. 27. - p. 219. [37] Shin H. K. [et al.] MOCVD of Titanium from a New Precursor, Ti [N (CH3) C2H5]4 [Journal]. - 1996. - Vol. 9. - pp. 76-80. [38] Stephen Elloit The Physics and Chemistry of Solids [Book]. - [s.l.]: John Wiley and Son, 1998. - p. 383. [39] Tauc J. C. In ‘Optical Properties of Solid.’ in (F.Abeles, ed) [Journal]. - Amsterdam: North-Holland Publishing, 1972. - p. 279. [40] Valkonen E. T., Karlsson B. Karlsson and Hojansson B. O. Proceedings of SPIE [Conference] // International Technical Conference. - [s.l.]: International Technical Conference, 1983. - Vol. 401. - p. 41. [41] Vittori O. Gold Bull [Book]. - [s.l.]: Encyclopaedia of Industrial Smith, 1979. - 12: p. 35. [42] Yang Z. [et al.] Effect of the Morphology on the Optical Properties of ZnO Nanostructured [Journal] // Physica E: Low-Dimensional Systems and Nanostructures. - 2009. - 2: Vol. 42. - pp. 116-119. [43] Yin S. et al [Journal] // J. Mater Chem. - 2005. - Vol. 82. - p. 674. [44] Yoon S. H. [et al.] Preparation of CdS Thin Films though MOCVD Method using Cd-S Single Source Precursors [Journal] // Bulletin of Korean Chemical Society. - 2006. - Vol. 27. - pp. 2071-2973.