[01] Dler Adil Jameel, School of Physics and Astronomy, Nottingham Nanotechnology and Nanoscience Center University of Nottingham, Nottingham, United Kingdom; Department of Physics, Faculty of Science, University of Zakho, Duhok, Kurdistan Region, Iraq.

During the last many decades the methods of forming thin films materials have increased significantly. In general, thin film is a small thickness that produces by physical vapour deposition (PVD) and chemical vapour deposition (CVD). Despite the PVD technique has a few drawbacks, it remains an important method and more beneficial than CVD technique for depositing thin films materials. This project examines some remarkable similarities and differences between PVD and CVD systems as well as evaluates the different techniques of depositing thin film. The majority of researchers have attempted to explain and justify the most precise system for depositing thin film since it is important in several applications such as surgical/medical and automotive. It is concluded that the most efficient method of depositing is PVD process. In addition, it has been found that there are more differences than similarities between PVD and CVD processes.

Thin Film, Physical Vapour Deposition (PVD), and Chemical Vapour Deposition (CVD)

[01] AZoM (2002) Physical Vapour Deposition (PVD) - An Introduction [02] Physical vapour Deposition (PVD)– An Introduction [online] available from [29 July 2012] [03] Bhat, D. G. (2006) ‘Chemical Vapour Deposition’. In Coatings Technology Handbook. ed. by Tracton, A. A. 3rd edn. USA (City not mentioned): Taylor & Francis Group, LLC [04] Chopra, K. L. (1969) Thin Film Phenomena. New York: McGraw-Hill [05] Choy, K. L. (2003) Chemical vapour deposition of coatings. London: Elsevier Science Ltd. [06] Cvimells Griot (n.d) Thin–film production [online] available from [28 July 2012] [07] ETAFILM Technology Inc (n.d) Optical Thin Film Deposition Technology History–Thermal evaporation [online] available from [25 July 2012] [08] Freund, L. B., and Suresh, S. (2003) Thin Film Materials. Cambridge: Cambridge University Press [09] Jameel, D. (2008) X-Ray Diffraction and DC Electrical Conductivity for Te61.8Se38.2 Thin Films. Unpublished MSc thesis. Duhok: University of Duhok [10] Korkin, A., Gusev, E., Labanowski, J., and Luryi, S. (2007) Nanotechnology for Electronic Materials and Devices. New York USA: Springer Science+Business Media, LLC [11] MEMS net (n. d) Thin Film Deposition Processes [online] available from [01 August 2012] [12] Pathan, H. M., and Lokhande, C. D. (2004) ‘Deposition of metal chalcogenide thin films by successive ionic layer adsorption and reaction (SILAR) method’. Bull. Mater. Sci. 27 (2), 85-111 [13] SiliconFarEast (2004) Physical Vapour Deposition (PVD) by Sputtering [online] available from [26 July 2012] [14] Singh, J., and Shimakawa, K. (2003) Advances in Amorphous Semiconductors. London and New York: Taylor & Francis. [15] Vossen, J. L. (1991) Material Science of Thin Films. 2nd edn. New Jersey: Milton Ohring [16] Wasa, K., Kitabatake, M., and Adechi, H. (2004) Thin Film Materials Technology. United States: WalliamAndrew, Inc and Springer